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专利名称：System and method for electromagnetic
interference shielding for critical dimension-scanning electron microscope
发明人：Chia-Chi Tsao,Syun-Jie Jhan,Yi-Cheng
Shih,Chwen Yu
申请号：US14158591申请日：20140117公开号：US052330B2公开日：20150210
专利附图：
摘要：System and method for EMI shielding for a CD-SEM are described. One
embodiment is a scanning electron microscope (“SEM”) comprising an electron gun forproducing an electron beam directed toward a sample; a secondary electron (“SE”)detector for detecting secondary electrons reflected from the sample in response to theelectron beam; and a dual-layer shield disposed around and enclosing the SE detector.The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
申请人：Taiwan Semiconductor Manufacturing Company, Ltd.
地址：Hsin-Chu TW
国籍：TW
代理机构：Haynes and Boone, LLP
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